As part of IEN’s mission to develop and cultivate the next generation of technologists, our team hosts numerous professional development lectures and short courses. Course and lecture topics include cleanroom fabrication techniques, advanced lithography techniques, market sector applications of nanotechnology research, and seminars on nanotechnology as it relates to other fields of engineering. These events are open to both GA Tech and other institutions’ researchers and educators, as well as to those in industry and the interested public.
All events are listed in chronological order, please scroll down to find and register for the event for which you are interested.
IEN Technical Seminar Series: Plasma Processing of Thin Film
Abstract: Fabrication of devices and structures for integrated circuits, sensors, photonics, and MEMS/NEMS requires layers of patterned thin films. For nearly all film materials, patterns are generated by lithographic processes, followed by plasma etching. Plasmas or glow discharges are ionized gases that contain electrons, ions, neutral species and photons that promote chemical reactions and ensure that anisotropic etch profiles can be obtained. This tutorial will discuss the fundamental physics and chemistry of plasmas, plasma reactor configurations, unique properties of plasmas that allow thin film processing for a variety of applications, and approaches to control etch rates, profiles, and etch selectivity.
Speaker Bio: Dennis W. Hess is the Thomas C. DeLoach Jr., Professor of Chemical and Biomolecular Engineering at the Georgia Institute of Technology. His research interests include thin films, surfaces, and interfaces, especially as applied to microelectronics and polymer processing. He received a B.S. in Chemistry from Albright College, and M.S. and Ph.D. degrees in Physical Chemistry from Lehigh University. He was a Member of the Research Staff and Supervisor of Process Development at Fairchild Semiconductor from 1973 to 1977. From 1977 to 1991 he was a faculty member in the Chemical Engineering Department at the University of California, Berkeley, where he also served as Assistant Dean, College of Chemistry (1982-1987) and Vice Chair, ChE Department (1988-1991). From 1991-1996, he served as Chair of the Chemical Engineering Department at Lehigh University. He joined the School of Chemical & Biomolecular Engineering at Georgia Tech in 1996.
IEN Short Course: Soft Lithography for Microfluidics
The Institute for Electronics and Nanotechnology (IEN) at Georgia Tech will offer a new short course on “Soft Lithography for Microfluidics” on April 13 & 14, 2017. This course module is designed for individuals interested in hands-on training in the fabrication of microfluidic devices using the soft lithography technique. This 2 day intensive short course will be structured to assume no prior knowledge of the technologies by the participants. The course agenda is evenly divided between laboratory hands-on sessions, including SU-8 master mold creation using photolithography and PDMS device fabrication in the IEN cleanroom, and supporting lectures. The goal for this course is to impart a basic understanding of soft lithography for microfluidic applications as practiced in academia and industry.
This short course is open to off-campus researchers from academia, industry and government laboratories/organizations and is not limited to current Georgia Tech students or IEN users. Anyone who is interested in starting research in the area of microfluidics or PDMS device fabrication is invited and strongly encouraged to participate.
Rates: *Rates include lunches on all days*
Georgia Tech Rate: $150
Academic and Government Rate: $300
Industry Rate: $600
IEN Industry Seminar Series: Industrial Applications of Atomic Layer Deposition
Knowing the need for high quality, thin films has created a large scale push for advanced industrial methodologies. Atomic layer deposition (ALO) applications has grown exponentially over the past years from the constant decreasing of integrated device structures to provide high performance devices to superior corrosion resistance coatings to enable protection in harsh environments. This seminar will cover 1) how ALO has become the technology of choice for advanced coating applications, 2) what hardware is utilized for high-throughput industrial applications 3) how ALO impacts the performances of 111-V based semiconductor devices 4) where the new technological developments are emerging for ALO.
Who Should Attend:
This seminar is for scientists, researchers, facility managers, industrial managers and engineers who are engaged in thin films deposition and would like to learn more about the benefits of ALO. The main objective is to educate the audience over the latest and forthcoming developments as well as providing an overview of the systems utilized for engineering thin-films.
Complimentary Lunch Provided with Registration.