Connect with IEN

As part of IEN’s mission to develop and cultivate the next generation of technologists, our team hosts numerous professional development lectures and short courses. Course and lecture topics include cleanroom fabrication techniques, advanced lithography techniques, market sector applications of nanotechnology research, and seminars on nanotechnology as it relates to other fields of engineering. These events are open to both GA Tech and other institutions’ researchers and educators, as well as to those in industry and the interested public.

All events are listed in chronological order, please scroll down to find and register for the event for which you are interested.


August 14 - 16, 2017

IEN Short Course: Micro-fabrication

The Institute for Electronics and Nanotechnology (IEN) at Georgia Tech will offer a short course on micro-fabrication from August 14 - 16, 2017. This in­tensive 3 day short course combines classroom lectures and laboratory based hands-on fabrication in the IEN cleanroom. The goal of the course is to impart a basic understanding of the science and technology of micro-fabrication processes as used in academia and industry.

This short course will cover essential micro-fabrication techniques including, photolithography, thin film deposition, etching, packaging, and characterization. Attendees will gain valuable experience by fabricating simple devices in one of the most advanced uni­versity cleanrooms in North America.

Target Audience:
Attendance is open to the general technical community and is not limited to current Georgia Tech students or IEN users. Anyone interested in cleanroom fabrication techniques is strongly encouraged to attend this course. The course is suitable for both new and experienced researchers interested in micro-fabrication techniques and applications.

A course emphasis will be placed on IEN cleanroom resources, however, the concepts and techniques discussed are applicable to a broad array of research in this field.

Rates: *Rates include lunches on all days*

Georgia Tech Rate: $200
Academic and Government Rate: $400
Industry Rate: $800

Registration:
Due to the nature of the lab portion of the course, registration has a maximum of 30 participants. Your registration is not guaranteed until full payment is received. If you wish to charge the course to an IEN Cleanroom account, please contact us immediately so that we can provide the proper forms, and so that we may notify the PI or accounts representative. Credit cards are the only payment option for people outside Georgia Tech. Once you submit your registration, follow the appropriate links in your confirmation email. A waiting list of overflow registrants will be maintained in case of cancellations.

 

For course agenda and registration, click this link


Tuesday August 15, 2017 @ 11:45AM EST

Marcus Nanotechnology Building - Room 1117

Atom Probe Tomography: Applications and Techniques

Atom Probe Tomography (APT) is the highest spatial resolution analytical characterization technique with high efficiency single atom detection for quantitative atomic scale 3D elemental mapping of chemical heterogeneities. Learn more about this technique and how it may be applied to your research at this event.

Agenda Topics:

Atom Probe Tomography (APT): Operational Theory
Introduction to APT Data Reduction
Introduction to APT Sample Preparation
APT Applications

  • Metals: Integration with Advanced Modeling
  • Ceramics, high performance materials
  • Semiconductor Devices: Planar and finFET, LED Devices, III/V
  • Geological Materials and Biominerals

Correlative synergy

  • t-EBSD
  • TEM
  • EPMA

Atom Probe Tomography Instrumentation

 

Lunch included with Registration.
Attendance is free of charge but space is limited!
To register, please complete the registration form by August 8th 2017.

 


Thursday August 17, 2017 @ 1:30PM EST

SENIC Webinar Series: Nanoscribe Photonic Professional GT - Submicron Resolution 3D Printing

Online Webinar

Presenter: Devin K. Brown
Senior Research Engineer
Institute for Electronics & Nanotechnology
Georgia Institute of Technology

The Nanoscribe Photonic Professional GT is a direct laser writing system that uses two photon absorption to create 3D, 2.5D, and 2D structures with submicron resolution.  The Nanoscribe system sets new standards in 3D microprinting and maskless lithography. This highest resolution 3D printer enables the rapid fabrication of nano-, micro- and mesostructures with feature sizes starting from about hundred nanometers up to several micrometers. Surfaces typically covered are in the range of up to a few cm² laterally and print volumes of up to several 10 mm³. Unlike other 3D printing technologies, layer thickness and thus a resulting surface roughness is just a question of the right set of parameters – thus optical quality surface finishes can be reached.

This 30-minute webinar will provide an overview of the Nanoscribe system with a discussion of key features and capabilities followed by time for Q & A.  

Who should attend: Faculty, scientists, engineers, researchers, and technical staff from university, company, or government labs who are interested in learning about how this new 3D printing capability might enable their research efforts.

 


August 17&18, 2017

Announcing a New Short Course: Surface Science Techniques – Focus on Photoelectron Spectroscopy and ToF-SIMS

A detailed introduction to the principles and practice of two techniques for analyzing the first few monolayers of a surface: XPS -the most common surface analytical method and ToF-SIMS a mass-spectroscopy-based method complementary in many ways to XPS.  Taken together they allow:

  • The detection of the elemental composition of a sample
  • The detection of even trace elements down to ppm of a monolayer
  • The chemical bonding between elements
  • The lateral and vertical distribution of elements in the top layers of a sample
  • The surface bonding and band structure of compounds including work function and band occupancy

Target Audience:
Attendance is open to the general technical community and is not limited to current Georgia Tech students or IEN users. The course will be of value to anyone needing to analyze the physical-chemical properties of surfaces including catalysts; thin-film metals and semiconductors; low-dimensional materials such as graphene, CNT's, and MoS2; polymers for food packaging or medical implants; corrosion studies in metals; among other materials. The course should prove useful to everyone from the interested novice, unfamiliar with these techniques - but with a practical need for information about the surface composition/chemistry of a sample - up to those with even a moderately advanced practical XPS or SIMS background looking to develop a deeper understanding.

Preliminary Agenda

Day1 – Photoelectron Spectroscopy:
09:00                Introduction and Scope of Short Course – Prof. F. Alamgir
09:15 – 10:00:  Lecture pt. I:  Theoretical background of Photoelectron Spectroscopy
10:05 – 10:30:  Tour of MCF characterization labs
10:35 – 10:45:  Coffee break
10:50 – 11:35:  Lecture pt. II:  Theoretical background of Photoelectron Spectroscopy
12:00 – 13:00:  Lunch break
13:05 – 13:45:  Introduction to XPS analysis software
13:45 – 15:05:  XPS hands-on operation and data analysis sessions. 
15:10 – 16:00:  General comments:  Open question and answer session

Day2 – Time of Flight SIMS:
09:30                Introduction– Prof. F. Alamgir
09:35 – 10:15:  Lecture pt. I:  Theoretical background of SIMS/ ToF-SIMS
10:15 – 10:30:  Tour of IEN microfabrication facility
10:35 – 10:45:  Coffee break
10:50 – 11:30:   Practical concerns for ToF-SIMS and Alternate Surface Science Techniques
11:30 – 13:00:   Lunch break
13:05 – 13:15:   Introduction to ToF-SIMS analysis software
13:15 – 15:15:   ToF-SIMS for hands-on analysis session.
15:20 – 15:55:   Open question and answer session
 

Questions? Please contact:
Prof. Faisal Alamgir, faisal.alamgir@mse.gatech.edu , or
Walter Henderson, walter.henderson@gatech.edu

 


September 21 & 22, 2017

IEN Short Course: Soft Lithography for Microfluidics

The Institute for Electronics and Nanotechnology (IEN) at Georgia Tech will offer a short course on “Soft Lithography for Microfluidics” on April 13 & 14, 2017. This course module is designed for individuals interested in hands-on training in the fabrication of microfluidic devices using the soft lithography technique. This 2 day intensive short course will be structured to assume no prior knowledge of the technologies by the participants. The course agenda is evenly divided between laboratory hands-on sessions, including SU-8 master mold creation using photolithography and PDMS device fabrication in the IEN cleanroom, and supporting lectures. The goal for this course is to impart a basic understanding of soft lithography for microfluidic applications as practiced in academia and industry.

Target Audience:
This short course is open to off-campus researchers from academia, industry and government laboratories/organizations and is not limited to current Georgia Tech students or IEN users. Anyone who is interested in starting research in the area of microfluidics or PDMS device fabrication is invited and strongly encouraged to participate.

Rates: *Rates include lunches on all days*

  • Georgia Tech Rate: $150
  • Academic and Government Rate: $300
  • Industry Rate: $600

Registration:
Due to the nature of the lab portion of the course, registration has a maximum of 30 participants. Your registration is not guaranteed until full payment is received. If you wish to charge the course to an IEN Cleanroom account, please contact us immediately so that we can provide the proper forms, and so that we may notify the PI or accounts representative. Credit cards are the only payment option for people outside Georgia Tech. Once you submit your registration, follow the appropriate links in your confirmation email. A waiting list of overflow registrants will be maintained in case of cancellations.

Enhance Your Lab Skills and Learn to Make a PDMS Device!