Dr. Dennis Hess received his B.S. in 1968 from Albright College, and his M.S. and Ph.D. from Lehigh University in 1970 and 1973 respectively. Dr. Hess is the Thomas C. DeLoach, Jr. Chair and Director of Georgia Tech’s NSF Materials Research Science and Engineering Center (MRSEC) for New Electronic Materials.
Dr. Hess also directs the Hess research group, which investigates thin film and coating processes as related to integrated circuits, electronic materials, sensors, and surface modification of materials. Fundamental electrical, optical, mechanical and chemical properties of the films are explored in order to devise unique film materials and processing sequences relevant to microelectronic device fabrication and to value-added products including metals, polymers, paper, and paperboard products. Various methods for the deposition, removal, and characterization of the thin films are being explored in an effort to develop novel processes and materials. Specific processes of interest for film and coating applications include spin-casting, plasma-assisted deposition, supercritical, subcritical and atmospheric pressure fluids for surface cleaning and modification, atomic layer deposition, and chemical vapor deposition.
Research Areas of Interest: